Experts in Laser-Atom Scaling, Frequency Combs and EUV Lithography to Headline All-Virtual OSA High-brightness

Louis DiMauro, Jun Ye and Jos Benschop to describe latest innovations in the field

WASHINGTON – The all-virtual OSA High-brightness Sources and Light-driven Interactions Congress will feature three highly anticipated plenary talks on discoveries driving research and emerging technologies. Attendees for the congress, to be held 16 – 20 November, will hear presentations on latest advances in high-brightness sources, attosecond science, light-driven interactions and mid-IR laser technologies. The conference is being presented at no cost for registrants.

In his talk titled “Scaling intense laser-atom interactions from low to high frequency,” Louis DiMauro, Professor of Physics and Hagenlocker Chair at the Ohio State University, USA, will describe how studies of wavelength scaling are driving a renewed interest in potential applications in attosecond and imaging science. DiMauro and his collaborators are known for introducing the widely accepted semi-classical model in strong-field physics. His current work is focused on the generation, measurement and application of attosecond x-ray pulses and the study of fundamental scaling of strong field physics. DiMauro’s plenary talk is scheduled for Tuesday, 17 November, 16:00 – 17:00 UTC, 11:00 – 12:00 EST.

Jun Ye, Fellow, University of Colorado at Boulder JILA, USA, will discuss “Frequency combs and applications from the extreme ultraviolet to mid infrared” in his talk. Ye will explore technical approaches on producing the brightest sources for frequency combs and their applications for novel spectroscopy. His research focuses on the frontiers of light-matter interactions and includes precision measurement, quantum physics and ultracold matter, optical frequency metrology, and ultrafast science. Ye’s talk is scheduled for Wednesday, 18 November, 13:30 – 14:30 UTC, 08:30 – 09:30 EST.

In his presentation, “EUV lithography has entered high volume manufacturing,” Jos Benschop, Senior Vice President Technology at ASML, Netherlands, will describe how Extreme Ultraviolet (EUV) Lithography, using 13.3 nm wavelength, entered high volume manufacturing with Autumn 2019 commercially available smartphones. Future challenges, both for scanner as well as metrology sources, will be noted in his talk scheduled for Thursday, 19 November, 16:00 – 17:00 UTC, 11:00 – 12:00 EST.

The congress is comprised of three OSA Topical Meetings: Compact (EUV and X-Ray) Light Sources, High-intensity Lasers and High-field Phenomena and Mid-infrared Coherent Sources. Participants will address technical challenges in the development of high-brightness sources at all wavelengths, from x-ray to mid-IR.

Registration is now open

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